Atomic Layer Deposition (ALD)

原子层沉积

ALD generates conformal ultra-thin films with sub-nm precision and has been widely used in fabrication of nm-scale materials and devices.

原子层沉积技术能够制备出均一、共形的超薄膜材料,具有亚纳米级厚度可控的优点,并可广泛应用于纳米材料及器件的制备。

Initiated Chemical Vapor Deposition 

引发式化学气相沉积(iCVD)

iCVD is a solvent-free process for synthesizing polymer thin films (<10 nm) using free radical polymerization, a very powerful tool for surface modification.

引发式化学气相沉积运用自由基聚合反应,能够制备均一、共形的超薄高分子膜材料,是一项十分强大的表面修饰的技术。

Metal-Organic Frameworks (MOFs)

​金属有机框架材料

MOFs possess ultra-high surface area and well-defined pore structures, promising for applications in adsorption, catalysis, and separations. 

金属有机框架材料具有超大比表面积、规整的孔道结构,在吸附、催化、分离中都极具应用前景。

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