© 2019 Zhejiang Univeristy Junjie Zhao Group

Atomic Layer Deposition (ALD)

​原子层沉积

ALD generates conformal ultra-thin films with sub-nm precision and has been widely used in fabrication of nm-scale materials and devices.

原子层沉积技术能够制备出均一、超薄膜材料,具有厚度在亚纳米级可控的优点,并可广泛应用于微纳材料及器件的制备。